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Proceedings Paper

DUV laser lithography for photomask fabrication
Author(s): Curt A. Jackson; Peter Buck; Sarah Cohen; Vishal Garg; Charles Howard; Robert Kiefer; John Manfredo; James Tsou
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Paper Abstract

In the recent past significant work has been done to isolate and characterize suitable single layer Chemically Amplified Resist (CAR) systems for DUV printing applicable to photomask fabrication. This work is complicated by the inherent instability of most DUV CAR systems, particularly in air, showing unacceptable CD degradation over the normal photomask write time in today's DUV mask pattern generators. The high reflectivity of most photomask substrates at DUV wavelengths, creating unacceptable standing waves in the photo resist profile, further compounds this problem. A single layer CAR system suitable for 90nm technology node mask fabrication with DUV printing has been characterized and optimized. Results of this optimization in terms of relevant mask making parameters will be detailed. Furthermore, comparison of the properties of this resist system to other commercially available systems, including FEP-171, will be shown. The pattern fidelity of DUV laser generated masks has been studied in considerable detail. A demonstration of the capabilities of the Etec Systems ALTATM 4300 and Micronic Laser Systems Sigma 7100 DUV mask writing systems will be shown. The pattern fidelity achieved will be compared/contrasted to that achieved with today's leading edge 50KeV vector scan e-beam systems. Advanced methods for modulating the DUV printed patterns' fidelity will be detailed. Finally, the cost and cycle time implications of inserting the DUV laser pattern generator into the mask manufacturing flow will be discussed.

Paper Details

Date Published: 17 December 2003
PDF: 12 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518269
Show Author Affiliations
Curt A. Jackson, DuPont Photomasks, Inc. (United States)
Peter Buck, DuPont Photomasks, Inc. (United States)
Sarah Cohen, DuPont Photomasks, Inc. (United States)
Vishal Garg, DuPont Photomasks, Inc. (United States)
Charles Howard, DuPont Photomasks, Inc. (United States)
Robert Kiefer, DuPont Photomasks, Inc. (United States)
John Manfredo, DuPont Photomasks, Inc. (United States)
James Tsou, DuPont Photomasks, Inc. (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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