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Proceedings Paper

Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM
Author(s): Gim Chen; Julio Reyes; James L Wood; Ismail Kashkoush; Laurent Dieu; Richard Novak
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Paper Abstract

Spin spray and bath immersion systems are still the competing technologies for mask process. The preference for one or the other is largely dependent on factor such as performance, size, throughput, and cost. This paper focuses on the process optimization of the immersion bath technology in relation to the performance such as particulate soft defects, EAPSM optical parameter change, and antireflective layer reflectivity.

Paper Details

Date Published: 17 December 2003
PDF: 8 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518247
Show Author Affiliations
Gim Chen, Akrion, LLC (United States)
Julio Reyes, DuPont Photomasks, Inc. (United States)
James L Wood, DuPont Photomasks, Inc. (United States)
Ismail Kashkoush, Akrion, LLC (United States)
Laurent Dieu, DuPont Photomasks, Inc. (United States)
Richard Novak, Akrion, LLC (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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