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Proceedings Paper

Parallel processing approaches in RET and MDP: new hybrid multithreading and distributed technology for optimum throughput in a hierarchical flow
Author(s): Steffen F. Schulze; Emile Sahouria; Robert Todd; Laurence Grodd; Mary Finch
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Paper Abstract

The continuous integration trend in design and broad deployment of resolution enhancement techniques (RET) have a tremendous impact on circuit file size and pattern complexity. Increasing design cycle time has drawn attention to the data manipulation steps that follow the physical layout of the design. The contributions to the total turn-around time for a design are twofold: the time to get the data ready for the hand-off to the mask writer is growing, but also the time it takes to write the mask is heavily influenced by the size and complexity of the data. In order to reduce the time that is required for the application of RET and the export of the data to mask writer formats, massively parallel processing approaches have been described. This paper presents such computing algorithms for the hierarchical implementation of RET and mask data preparation (MDP). We focus on the parallel and flexible deployment of a new hybrid multithreaded and distributed processing scheme in homogeneous and heterogeneous computer networks called MTFlex. We describe the new methodology and discuss corresponding hardware and software configurations. The application of this “MTFlex” computing scheme to different tasks in post-tapeout data preparation is shown in examples.

Paper Details

Date Published: 17 December 2003
PDF: 12 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518230
Show Author Affiliations
Steffen F. Schulze, Mentor Graphics Corp. (United States)
Emile Sahouria, Mentor Graphics Corp. (United States)
Robert Todd, Mentor Graphics Corp. (United States)
Laurence Grodd, Mentor Graphics Corp. (United States)
Mary Finch, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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