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Proceedings Paper

Taking advantage of vendor automation with SEMI P10
Author(s): Mike Behnam; Jim McCracken
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Paper Abstract

Although the first version of the SEMI P10 “Specification of Data Structures for Photomask Orders” was introduced over ten years ago and is supported by all of the major photomask vendors, only a few chip suppliers currently take advantage of this automated order entry infrastructure. This is unfortunate because placing a photomask order by transmitting a P10 file reduces errors and improves throughput time. The hierarchical structure and comprehensive support for fracturing software, writing tools, defect inspection systems, and metrology equipment, allow tapeout groups to define very complex photomask orders in a P10 file. Mix and match reticle sets utilizing multiple steppers, multi-layer reticles, process development reticles with dozens of pattern files per layer, and phase shift reticles can all be defined in a P10 file. However, the extensive capabilities and the scalability of SEMI P10 come at a price. The specification is complicated -- the latest release is over 40 pages in length and defines over 500 record types. Before a software system that automates P10 file writing can be successfully implemented, the P10 spec must be studied from a number of perspectives. These include the user interface requirements, present and future photomask needs, vendor preferences for P10 file structure and content, and process file management. This paper will present a brief overview of the P10 structure and capabilities, describe how Agilent Technologies, Photomask Technology Center (PTC) made the decision to upgrade its reticle order management software with RetBuilder from CenterLink.

Paper Details

Date Published: 17 December 2003
PDF: 6 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518222
Show Author Affiliations
Mike Behnam, Agilent Technologies (United States)
Jim McCracken, CenterLink (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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