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Proceedings Paper

Elimination of RIE-lag in 193-nm alternate aperture phase-shift mask fabrication
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Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, ; doi: 10.1117/12.518148
Show Author Affiliations
Brad H Reelfs, Unaxis USA, Inc. (United States)
Chris Constantine, Unaxis USA, Inc. (United States)
Jason Plumhoff, Unaxis USA, Inc. (United States)
Jong Shin, Unaxis USA, Inc. (United States)
Emmanuel Rausa, Unaxis USA, Inc. (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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