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Proceedings Paper

Global CD uniformity improvement in mask manufacturing for advanced lithography
Author(s): Shih-Ming Chang; Chih-Cheng C. Chin; Wen-Chuan Wang; Chi-Lun Lu; Ren-Guey Hsieh; Cherng-Shyan Tsay; Yung-Sung Yen; Sheng-Chi Chin; Hsin-Chang Lee; Ru-Gun Liu; Kuei-Shun Chen; Hung-Chang Hsieh; Yao Ching Ku; John C.H. Lin
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Paper Abstract

The control of global critical dimension uniformity (GCDU) across the entire mask becomes an important factor for the high-end masks quality. Three major proceses induce GCDU error before after-developing inspection (ADI) including the E-Beam writing, baking, and developing processes. Due to the charging effect, the fogging effect, the vacuum effect and other not-well-known effects, the E-Beam writing process suffers from some consistent GCDU errors. Specifically, the chemical amplified resist (CAR) induces the GCDU error from improper baking. This phenomenon becomes worse with negative CARs. The developing process is also a source of the GCDU error usually appears radially. This paper reports the results of the study of the impact of the global CD uniformity on mask to wafer images. It also proposes solutions to achieve better masks.

Paper Details

Date Published: 17 December 2003
PDF: 7 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518008
Show Author Affiliations
Shih-Ming Chang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chih-Cheng C. Chin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Wen-Chuan Wang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chi-Lun Lu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Ren-Guey Hsieh, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Cherng-Shyan Tsay, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yung-Sung Yen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Sheng-Chi Chin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Hsin-Chang Lee, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Ru-Gun Liu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Kuei-Shun Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Hung-Chang Hsieh, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yao Ching Ku, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
John C.H. Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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