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Proceedings Paper

CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication
Author(s): Bing Lu; James R. Wasson; Eric Weisbrod; Pawitter Mangat; Eric Ainley; Adolpho Rios; Kevin J. Nordquist
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Paper Abstract

In this work, we analyzed resist CD uniformity on 6025 substrates in terms of resist PEB sensitivity, PEB time, temperature variation during ramp up, hotplate vacuum and the application of a chill plate. We found that the resist PEB sensitivity, PEB time and the final temperature were the most important factors. By selecting low PEB sensitive resist and optimizing the bake conditions, the CD uniformity was greatly improved. The temperature profile of the hotplate configuration used for this study will be discussed along with the CD uniformity obtained using this hotplate under various conditions.

Paper Details

Date Published: 17 December 2003
PDF: 8 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.517989
Show Author Affiliations
Bing Lu, Motorola, Inc. (United States)
James R. Wasson, Motorola, Inc. (United States)
Eric Weisbrod, Motorola, Inc. (United States)
Pawitter Mangat, Motorola, Inc. (United States)
Eric Ainley, Motorola, Inc. (United States)
Adolpho Rios, Motorola, Inc. (United States)
Kevin J. Nordquist, Motorola, Inc. (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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