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Proceedings Paper

Yield Mask: the latest developments and their application in a mask house production environment
Author(s): Annemarie MacKenzie; Rudolf Laubmeier; Ankush Oberai; Sana Shaikh; Gerd Stockmann
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Paper Abstract

Yield Mask, the first commercial Yield Management tool specifically developed for a Mask House, has been introduced and the necessity for such Yield Management system, given the current demands on high-end mask production, ascertained. In particular, Yield Mask has been shown to be a highly effective, defect-data analysis tool, with fully automated data collection and a database structure facilitating fast and flexible data retrieval and correlation, for process, inspection, SEM-review and repair data. The latest features of Yield Mask are now reported, including macros, user-definable sampling, user-definable grouping and defect tracking. These features are shown to enhance the efficiency of Yield Mask in a production environment. Macros are shown to significantly decrease the manpower required to run standard analysis routines, accommodating continuous monitoring and analysis of the data. User-definable sampling is shown to allow users to select defects of particular interest, within a given inspection report for subsequent SEM review. This significantly increases the efficiency of review carried out using basic sampling criteria. Lastly, user-definable grouping, along with defect tracking are shown to be advantageous in the selection of any, desired combination of data, for comparison and/or correlation.

Paper Details

Date Published: 17 December 2003
PDF: 12 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.517083
Show Author Affiliations
Annemarie MacKenzie, Infineon Technologies AG (Germany)
Rudolf Laubmeier, Infineon Technologies AG (Germany)
Ankush Oberai, FEI Knights Division (United States)
Sana Shaikh, FEI Knights Division (United States)
Gerd Stockmann, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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