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Proceedings Paper

Effects of reticle reflectance on lithography
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Paper Abstract

We report in this work experimental and theoretical results showing the effects of absorber reflectivity on standard flare measurements, image formation and how this may contribute to various image metrics used in lithography. Our study shows that under typical conditions the reflectance from the absorber film has only a small effect on the image produced by the exposure system.

Paper Details

Date Published: 17 December 2003
PDF: 10 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.516925
Show Author Affiliations
Kevin D. Cummings, ASML (United States)
Bernd Geh, Carl Zeiss (Germany)
Bing Lu, Motorola, Inc. (United States)
James R. Wasson, Motorola, Inc. (United States)
Eric Weisbrod, Motorola, Inc. (United States)
William J. Dauksher, Motorola, Inc. (United States)
Kevin J. Nordquist, Motorola, Inc. (United States)
Pawitter Mangat, Motorola, Inc. (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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