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Proceedings Paper

Yield Mask: first professional yield management tool specifically developed for a mask house
Author(s): Rudolf Laubmeier; Annemarie MacKenzie; Gerd Stockmann; Sana Shaik; Steve White
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Paper Abstract

To support the continuing Defect Engineering activities in the Infineon Mask House, a professional analysis tool has been developed for Defect Yield Management, in collaboration with EGsoft. EGSoft is the software division of Electroglas Inc. and suppliers ofthe YieldManager TM product, used for Yield Management in numerous wafer fabs. The requirement for such a tool was catalysed by the ever-increasing demand for sophisticated defect analysis, to accelerate defect learning and the identification of major and minor defect-related-yield detractors. Yield Mask consists of a database, which centrally stores all relevant information from Defect Inspection, Repair and Review tools in the Infineon Mask House and an analysis tool, which allows users to analyse the data collected on their PC. The analysis tool can be divided into six major modules: Data Set Builder, Mask Map, Map Gallery, Image Gallery, Charting and Customise: The functionality of the above-mentioned modules is presented and their application in the analysis of defect data demonstrated. The tool is shown to be an invaluable, cost-effective labour-saving device in a high-end Mask House, where the time required to analyse and resolve defect problems can be dramatically reduced.

Paper Details

Date Published: 28 May 2003
PDF: 10 pages
Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.515142
Show Author Affiliations
Rudolf Laubmeier, Infineon Technologies AG (Germany)
Annemarie MacKenzie, Infineon Technologies AG (Germany)
Gerd Stockmann, Infineon Technologies AG (Germany)
Sana Shaik, Electroglas, Inc. (United States)
Steve White, Electroglas, Inc. (United States)


Published in SPIE Proceedings Vol. 5148:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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