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Proceedings Paper

System to improve the understanding of collected logistic data to optimize cycle time and delivery performance
Author(s): Wim-Jan van Rooijen; Ben Rodriguez
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Paper Abstract

A complex production mask house faces the issue of handling and understanding the logistics information from the production process of the masks. We managed to control key performance indicators like cycle time, flow-factor, linespeed, W1P, etc. To improve the line flow, we set up rules for optimising batching at operations and forbid batching between operations, we defined maximum and minimum WIP at the operations, scheduled urgency of the different lots and built rules for bottleneck management. Also we restricted the number of "hot lots". By migrating to the modem MES (manufacturing execution system) MaTISSe, which manages the shopfloor control, and a reporting database, we are able to eliminate the time deviations within our data, caused by data-extraction for different reports at different moments. This gives us a better understanding of our fixed bottleneck and a faster recognition of the temporarily bottlenecks caused by missing availability of machines or men. In this paper we describe the features and advantages of our new MES, as well as the migration process. After approx. 6 months we already achieved considerable benefits. Our plan is to extend decision support within the MES, to help both managers and operators to make the right decisions. The project behind this paper reaped major benefits described here and we are looking forward to further challenges and successes.

Paper Details

Date Published: 28 May 2003
PDF: 11 pages
Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.515141
Show Author Affiliations
Wim-Jan van Rooijen, Infineon Technologies AG (Germany)
Ben Rodriguez, Nimble N.V. (Belgium)

Published in SPIE Proceedings Vol. 5148:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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