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Proceedings Paper

Ultrathin-membrane EPL masks
Author(s): J. Greschner; T. Bayer; S. Kalt; H. Weiss; Phillip L. Reu; Roxann L. Engelstad; Obert R. Wood; Carey M. Thiel; Michael S. Gordon; Rajinder S. Dhaliwal; Christopher F. Robinson; Hans C. Pfeiffer
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Paper Abstract

Electron Projection Lithography ( EPL) is a leading candidate for the sub-65 nm lithography regime (1),(2). The development of a low-distortion mask is critical to the success of EPL. EPL has traditionally used either a stencil format mask with a single scatterer layer having the pattern represented by voids in the membrane (3), or a continuous membrane format mask with a patterned scatterer layer supported by an unperforated membrane(4).

Paper Details

Date Published: 28 May 2003
PDF: 2 pages
Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.515090
Show Author Affiliations
J. Greschner, Team Nanotec GmbH (Germany)
T. Bayer, Team Nanotec GmbH (Germany)
S. Kalt, Team Nanotec GmbH (Germany)
H. Weiss, Team Nanotec GmbH (Germany)
Phillip L. Reu, Univ. of Wisconsin/Madison (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Obert R. Wood, International SEMATECH (United States)
Carey M. Thiel, IBM Microelectronics Div. (United States)
Michael S. Gordon, IBM Microelectronics Div. (United States)
Rajinder S. Dhaliwal, IBM Microelectronics Div. (United States)
Christopher F. Robinson, IBM Microelectronics Div. (United States)
Hans C. Pfeiffer, IBM Microelectronics Div. (United States)


Published in SPIE Proceedings Vol. 5148:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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