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Proceedings Paper

Development and characterization of new CD mask standards: a status report
Author(s): Thomas Schatz; Bertram Hauffe; Stefan Dobereiner; Hans-Jurgen Bruck; Bernd Brendel; Lutz Bettin; Klaus-Dieter Roth; Walter Steinberg; Peter Speckbacher; Wolfgang Sedlmeier; Thomas Engel; Wolfgang Hassler-Grohne; Werner Mirande; Harald Bosse
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Paper Abstract

We report on the current status of a project on development and characterization of CD photomasks with 6025 format to be used as reference standards for different type of CD metrology instruments. The project consortium consists of mask suppliers, manufacturers of CD metrology instruments, users of such instruments and calibration laboratories. Different type of CD metrology instrumentation, namely optical CD microscopes, CD-SEM, and AFM will be applied for investigation and measurement of microstructures, additionally supported by AIMS tool. We will describe the basic design criteria of the mask standard and first measurement results gained with different metrology tools on the prototype mask standards.

Paper Details

Date Published: 28 May 2003
PDF: 12 pages
Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.514952
Show Author Affiliations
Thomas Schatz, Infineon Technologies AG (Germany)
Bertram Hauffe, Photronics MZD GmbH and Co. KG (Germany)
Stefan Dobereiner, MueTec GmbH (Germany)
Hans-Jurgen Bruck, MueTec GmbH (Germany)
Bernd Brendel, Leica Microsystems Lithography GmbH (Germany)
Lutz Bettin, Leica Microsystems Lithography GmbH (Germany)
Klaus-Dieter Roth, Leica Microsystems Wetzlar GmbH (Germany)
Walter Steinberg, Leica Microsystems Wetzlar GmbH (Germany)
Peter Speckbacher, Dr. Johannes Heidenhain GmbH (Germany)
Wolfgang Sedlmeier, Dr. Johannes Heidenhain GmbH (Germany)
Thomas Engel, Carl Zeiss Microelectronic Systems GmbH (Germany)
Wolfgang Hassler-Grohne, Physikalisch-Technische Bundesanstalt (Germany)
Werner Mirande, Physikalisch-Technische Bundesanstalt (Germany)
Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 5148:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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