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Proceedings Paper

Through the looking glass: what is on the horizon for the mask maker?
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Paper Abstract

The future of mask industry technology is in flux. While the requirements for current and near-term lithographic capability is well understood, advanced lithography options pose a completely new set of challenges to the mask maker. Challenges are not only process and materials related, but also include more fundamental concerns dealing with how to afford the necessary capability development. This paper identifies the issues and attempts to propose solutions to the industry's growing concerns.

Paper Details

Date Published: 28 May 2003
PDF: 5 pages
Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.514946
Show Author Affiliations
R. Scott Mackay, Photronics Inc. (United States)
Benjamin George Eynon, Photronics Inc. (United States)
Dhirendra P. Mathur, Photronics Inc. (United States)


Published in SPIE Proceedings Vol. 5148:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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