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Proceedings Paper

Contact angle measurements on polysilicon for surface micromachining applications
Author(s): Enakshi Bhattacharya; U. Venu Babu; L. Helen Anitha Rani; P. Pradeep; Parimi Ramaseshagiri Rao; Kunchinadka Narayana Hari Bhat
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Paper Abstract

Polysilicon layers deposited by Low Pressure Chemical Vapour Deposition (LPCVD) on sacrificial oxides are used for surface micromachined structures. Stiction is a major problem in surface micromachining both during processing and in use. Contact angle measurements on surfaces can give indication on the adhesivitiy of the surface. In this paper, contact angle measurements on polysilicon surface after different treatments are reported with a view to understand their stiction behavior. We also report on surface roughness measurements on these samples.

Paper Details

Date Published: 14 October 2003
PDF: 6 pages
Proc. SPIE 5062, Smart Materials, Structures, and Systems, (14 October 2003); doi: 10.1117/12.514520
Show Author Affiliations
Enakshi Bhattacharya, Indian Institute of Technology, Madras (India)
U. Venu Babu, Indian Institute of Technology, Madras (India)
L. Helen Anitha Rani, Indian Institute of Technology, Madras (India)
P. Pradeep, Indian Institute of Technology, Madras (India)
Parimi Ramaseshagiri Rao, Indian Institute of Technology, Madras (India)
Kunchinadka Narayana Hari Bhat, Indian Institute of Technology, Madras (India)


Published in SPIE Proceedings Vol. 5062:
Smart Materials, Structures, and Systems
S. Mohan; B. Dattaguru; S. Gopalakrishnan, Editor(s)

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