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Proceedings Paper

High-efficiency tin-based EUV sources
Author(s): Martin C. Richardson; Chiew-Seng Koay; Christian K. Keyser; Kazutoshi Takenoshita; Etsuo Fujiwara; Moza M. Al-Rabban
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Paper Abstract

We have previously proposed the use of mass-limited, tin-containing laser plasma sources for EUV lithography applications. Here we report advances in measurements of the spectral output, conversion efficiency, and debris emission from these sources. We also report progress in the use of repeller field debris inhibition techniques for this source.

Paper Details

Date Published: 7 January 2004
PDF: 9 pages
Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); doi: 10.1117/12.514083
Show Author Affiliations
Martin C. Richardson, CREOL/Univ. of Central Florida (United States)
Chiew-Seng Koay, CREOL/Univ. of Central Florida (United States)
Christian K. Keyser, CREOL/Univ. of Central Florida (United States)
Kazutoshi Takenoshita, CREOL/Univ. of Central Florida (United States)
Etsuo Fujiwara, Himeji Univ. (Japan)
Moza M. Al-Rabban, Qatar Univ. (Qatar)


Published in SPIE Proceedings Vol. 5196:
Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications
George A. Kyrala; Jean-Claude J. Gauthier; Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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