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Proceedings Paper

Compact high resolution four wave lateral shearing interferometer
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Paper Abstract

A simple, ultra-compact, four wave achromatic interferometric technique is used to measure with high accuracy and high transverse resolution wavefront of polychromatic lightsource. The wave front to be measured is replicated by a diffraction grating into four copies interfering together leading to an interference pattern very similar to the intensity distribution obtained in the focal plane of a Shack-Hartmann microlens array. The grating is made of optical glass modulated in depth on top of which a chromium mask is printed. The amplitude mask acts like a Hartmann plate. Used in association with the phase mask, it allows suppression of the unwanted zero and second orders. A CCD detector located in the vicinity of the grating records the interference pattern. This new wavefront sensor is able to resolve wavefront spatial frequencies 3 to 4 times higher than a conventional Shack-Hartmann technique using an equivalent CCD detector. Its dynamic is also much higher.

Paper Details

Date Published: 26 February 2004
PDF: 11 pages
Proc. SPIE 5252, Optical Fabrication, Testing, and Metrology, (26 February 2004); doi: 10.1117/12.513739
Show Author Affiliations
Jean-Christophe F Chanteloup, LULI-CNRS (France)
Univ. Paris VI (France)
Mathieu Cohen, LULI-CNRS (France)
Univ. Paris VI (France)

Published in SPIE Proceedings Vol. 5252:
Optical Fabrication, Testing, and Metrology
Roland Geyl; David Rimmer; Lingli Wang, Editor(s)

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