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Proceedings Paper

Metal-dielectric light absorbers manufactured by ion plating
Author(s): Michel Cathelinaud; Frederic Lemarquis; Jacques Loesel; Bernard Cousin
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Paper Abstract

In order to improve their mechanic and climatic properties, we studied the manufacturing of metal-dielectric light absorbers using an Ion Plating Process. The choice of the materials, Hf for the metal and SiO2 for the dielectric, allows us of to use the deposition plant for either metal dielectric or all dielectric HfO2-SiO2 coatings without any change. After an index characterization of metallic films, we manufactured monochromatic and broad-band coatings. These coatings have been qualified for space environment.

Paper Details

Date Published: 25 February 2004
PDF: 8 pages
Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); doi: 10.1117/12.513409
Show Author Affiliations
Michel Cathelinaud, Institut Fresnel, CNRS-ENSPM (France)
Frederic Lemarquis, Institut Fresnel, CNRS-ENSPM (France)
Jacques Loesel, Ctr. National d'Etudes Spatiales (France)
Bernard Cousin, Ctr. National d'Etudes Spatiales (France)


Published in SPIE Proceedings Vol. 5250:
Advances in Optical Thin Films
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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