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Proceedings Paper

Multiple-pulse laser irradiation study in silica: comparison between 1064 and 355 nm
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Paper Abstract

Cumulative laser irradiations are performed on silica at 1064nm and 355nm with a 7ns pulsed laser. The experiments are made in bulk and surface of materials thanks to a focused beam (12μm and 8μm respectively for each wavelength). The small beam size combined to a reliable statistical measurement of laser damage, allow us to plot accurate laser damage probability curves. Moreover the use of an adapted statistic model permit to deduce from these curves the laser damage precursor centers densities. These nano-sized precursors are established by different works to be responsive of the breakdown initiation. In a previous work realized at 1064nm, we have observed in our specific conditions, that multiple irradiation leads clearly to a decrease of the laser damage threshold. Furthermore we have highlighted that at this wavelength, the precursor densities were invariant with the number of shot. These results had given novel information about the damage initiation process. Indeed the same precursor centers seems to be involved in the initiation process in spite of the decrease of they laser damage threshold whatever the number of shot. In this paper we will shown new results obtained at 355nm in silica with the same measurement process. The case of silica surface is also examined for the two wavelengths. The experimental data exhibit a strong different behavior, regarding the precursor densities evolution versus the number of shot.

Paper Details

Date Published: 25 February 2004
PDF: 6 pages
Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); doi: 10.1117/12.513377
Show Author Affiliations
Jean-Yves Natoli, Institut Fresnel, CNRS-ENSPM (France)
Ecole Generaliste d'Ingenieurs de Marseille (France)
Bertrand Bertussi, Institut Fresnel, CNRS-ENSPM (France)
Ecole Generaliste d'Ingenieurs de Marseille (France)
Laurent Gallais, Institut Fresnel, CNRS-ENSPM (France)
Ecole Generaliste d'Ingenieurs de Marseille (France)
Mireille Commandre, Institut Fresnel, CNRS-ENSPM (France)
Ecole Generaliste d'Ingenieurs de Marseille (France)
Claude Amra, Institut Fresnel, CNRS-ENSPM (France)
Ecole Generaliste d'Ingenieurs de Marseille (France)


Published in SPIE Proceedings Vol. 5250:
Advances in Optical Thin Films
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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