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Proceedings Paper

Original optical metrologies of large components
Author(s): Bernard Cimma; Danielle Forest; Patrick Ganau; Bernard Lagrange; Jean-Marie Mackowski; Christophe Michel; Jean-Luc Montorio; Nazario Morgado; Renee Pignard; Laurent Pinard; Alban Remillieux
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Paper Abstract

The coating deposition on large optical components (diameter 350 mm) has required the development of new metrology tools at 1064 nm. To give realistic values of the optical performances, the whole surface of the component needs to be scanned. Our scatterometer (commercial system) has been upgraded to support large and heavy samples. The other metrology tools are prototypes we have developed. We can mention the absorption (photothermal effect) and birefringence bench, a control interferometer equipped with an original stitching option, the optical profilometer (RMS roughness and small defect measurements). A detailed description of these metrology benches will be exposed. Their sensitivity, accuracy and capability to map the optical properties of substrates or mirrors will be discussed. We will describe the recent developments: the stitching option adapted to the Micromap profilometer to measure the RMS roughness on larger area (exploration of a new spatial frequency domain), the accurate bulk absorption calibration.

Paper Details

Date Published: 26 February 2004
PDF: 12 pages
Proc. SPIE 5252, Optical Fabrication, Testing, and Metrology, (26 February 2004); doi: 10.1117/12.513279
Show Author Affiliations
Bernard Cimma, SMA-VIRGO (France)
Danielle Forest, SMA-VIRGO (France)
Patrick Ganau, SMA-VIRGO (France)
Bernard Lagrange, SMA-VIRGO (France)
Jean-Marie Mackowski, SMA-VIRGO (France)
Christophe Michel, SMA-VIRGO (France)
Jean-Luc Montorio, SMA-VIRGO (France)
Nazario Morgado, SMA-VIRGO (France)
Renee Pignard, SMA-VIRGO (France)
Laurent Pinard, SMA-VIRGO (France)
Alban Remillieux, SMA-VIRGO (France)


Published in SPIE Proceedings Vol. 5252:
Optical Fabrication, Testing, and Metrology
Roland Geyl; David Rimmer; Lingli Wang, Editor(s)

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