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Proceedings Paper

A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode
Author(s): Juan R Maldonado; Steven T. Coyle; Bassam Shamoun; Ming Yu; Timothy N. Thomas; Douglas E. Holmgren; Xiaolan Chen; B. DeVore; M. R. Scheinfein; Mark A. Gesley
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Paper Abstract

A raster multibeam lithography tool is in Etec’s roadmap to meet the stringent requirements of sub 100 nm mask fabrication. The tool leverages the long experience obtained with the ALTA laser pattern generators and the high resolution capabilities of e-beam lithography. A photocathode controlled by acousto-optic modulated 257nm laser beams is utilized to generate 32 electron beams. The beams are accelerated at 50 KV in an electron column, demagnified and focussed on the mask or wafer substrate. The performance of the photocathode and other system components will be presented together with preliminary lithographic patterning.

Paper Details

Date Published: 15 October 2003
PDF: 6 pages
Proc. SPIE 5220, Nanofabrication Technologies, (15 October 2003); doi: 10.1117/12.512863
Show Author Affiliations
Juan R Maldonado, Etec Systems, Inc. (United States)
Steven T. Coyle, Etec Systems, Inc. (United States)
Bassam Shamoun, Etec Systems, Inc. (United States)
Ming Yu, Etec Systems, Inc. (United States)
Timothy N. Thomas, TKD, Inc. (United States)
Douglas E. Holmgren, Etec Systems, Inc. (United States)
Xiaolan Chen, Etec Systems, Inc. (United States)
B. DeVore, Etec Systems, Inc. (United States)
M. R. Scheinfein, Simon Frasier Univ. (Canada)
Mark A. Gesley, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 5220:
Nanofabrication Technologies
Elizabeth A. Dobisz, Editor(s)

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