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Proceedings Paper

Experimental study of Fe/C multilayer performance: effects of substrate quality and of x-ray irradiation
Author(s): Eric Ziegler; M. Krisch; L. Vasquez; Jean Susini; Pierre Boher; Philippe Houdy
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Paper Abstract

Fe/C multilayers were rf-sputtered on two silicon substrates with substantial difference of surface quality. Microroughness and figure were measured for each substrate before and after layer deposition by using a scanning tunnelling microscope, an optical microscope interferometer, and a Fizeau interferometer. Although the optical quality of both substrates is better than that of current wafers, differences of x-ray reflectivity and peak shape are still observed. The better sample was exposed to an x-ray wiggler beam of 4.6 keV critical energy, so that the multilayer surface received a power density of 5W/mm2 during a 4 hour period, the sample being cooled from the backside. The reflection properties of the sample before and after x ray exposure are compared. At first glance we did not see any significant changes in reflectivity or bandpass, which is very promising for the use of multilayers on high-power synchrotron x-ray beamlines.

Paper Details

Date Published: 1 January 1992
PDF: 8 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51286
Show Author Affiliations
Eric Ziegler, European Synchrotron Radiation Facility (France)
M. Krisch, European Synchrotron Radiation Facility (France)
L. Vasquez, European Synchrotron Radiation Facility (France)
Jean Susini, European Synchrotron Radiation Facility (France)
Pierre Boher, Lab. d'Electronique Philips (France)
Philippe Houdy, Lab. d'Electronique Philips (France)


Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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