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Proceedings Paper

Simulation of the growth of Mo/Si multilayers
Author(s): David B. Boercker; W. Lowell Morgan
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Paper Abstract

The successful development of soft x-ray projection lithography will depend heavily on the production of efficient, durable optical components. A leading candidate for x-ray mirrors near 130 angstrom is multilayer structures made of alternating thin layers of Mo and Si. High- resolution electron microscopy reveals that the interface created by deposition of Mo on Si is much more diffuse than that produced by depositing Si on Mo. We have performed molecular dynamics simulations of the deposition process and observed significant penetration of the Si substrates by incident Mo atoms while Si atoms remain on the surface of the Mo substrates.

Paper Details

Date Published: 1 January 1992
PDF: 6 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51285
Show Author Affiliations
David B. Boercker, Lawrence Livermore National Lab. (United States)
W. Lowell Morgan, Kinema Research (United States)


Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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