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Proceedings Paper

Upgraded facility for multilayer mirror characterization at NIST
Author(s): Richard N. Watts; David L. Ederer; Richard D. Deslattes; Thomas B. Lucatorto; William Tyler Estler; Christopher J. Evans; Theodore V. Vorburger
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Paper Abstract

In response to the needs of the emerging field of normal incidence soft x-ray optics, a field with applications ranging from extreme ultraviolet (XUV) solar imaging to x-ray lithography, the National Institute of Standards and Technology (NIST) has initiated an XUV multilayer and optical substrate characterization program. In this paper, we give an overview of the present capabilities of the NIST facility and discuss some of the proposed improvements, concentrating on the new soft x-ray reflectometry facility being built at SURF.

Paper Details

Date Published: 1 January 1992
PDF: 8 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51284
Show Author Affiliations
Richard N. Watts, National Institute of Standards and Technology (United States)
David L. Ederer, National Institute of Standards and Technology (United States)
Richard D. Deslattes, National Institute of Standards and Technology (United States)
Thomas B. Lucatorto, National Institute of Standards and Technology (United States)
William Tyler Estler, National Institute of Standards and Technology (United States)
Christopher J. Evans, National Institute of Standards and Technology (United States)
Theodore V. Vorburger, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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