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Proceedings Paper

Two methods to improve the optical quality of Ni-C multilayer coatings: ion bombardment and optimization of the substrate temperature
Author(s): Eric J. Puik; S. W.M. van de Ven; W. J. Wolfis; Gert E. van Dorssen; Marnix J. van der Wiel; R. J.I.M. Koper; H. Zeijlemaker; Jan Verhoeven
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Paper Abstract

We report on two methods for producing multilayer optics with considerably better reflectivities than `state of the art' coatings: deposition at optimized substrate temperatures and application of ion beam bombardment. In the first case we show that deposition of Ni - C multilayer coatings at optimized substrate temperatures results in increases in reflectivity at (lambda) equals 6.76 nm with a factor of 1.4 (Toptimum approximately equals 100 degree(s)C, d approximately equals 5.0 nm) compared to those deposited at room temperature. In the case of ion bombardment (at room temperature) the increase in reflectivity is more dramatic: a factor of 4 was observed for ion etched Ni - C coatings compared to nontreated ones (ion beam of 200 eV Ar+ at an angle of incidence of 45 degree(s), d approximately equals 2.8 nm). We note that due to the difference in d-spacing of the coatings the increases can not be compared directly. Finally, we discuss thermal treatment of Ni - Si multilayer coatings: contrary to Ni - C we observed an increase in reflectivity at temperatures below room temperature.

Paper Details

Date Published: 1 January 1992
PDF: 7 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51282
Show Author Affiliations
Eric J. Puik, FOM Institute for Plasma Physics (Netherlands)
S. W.M. van de Ven, FOM Institute for Plasma Physics (Netherlands)
W. J. Wolfis, FOM Institute for Plasma Physics (Netherlands)
Gert E. van Dorssen, FOM Institute for Plasma Physics (Netherlands)
Marnix J. van der Wiel, FOM Institute for Plasma Physics (Netherlands)
R. J.I.M. Koper, FOM Institute for Atomic and Molecular Physics (Netherlands)
H. Zeijlemaker, FOM Institute for Atomic and Molecular Physics (Netherlands)
Jan Verhoeven, FOM Institute for Atomic and Molecular Physics (Netherlands)


Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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