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Proceedings Paper

Multilayer mirrors for XUV Ge laser wavelengths
Author(s): Claude Montcalm; Brian Thomas Sullivan; Henri Pepin; Jerzy A. Dobrowolski; G. D. Enright
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Paper Abstract

Mo/Si multilayer mirrors with a high reflectance at normal incidence in the 232 - 236 angstrom spectral region have been deposited by rf magnetron sputtering for use in a XUV Ge-laser. The mirrors had a peak reflectance of 26% in this wavelength region. Characterization by TEM and XRD indicates good thickness control in the deposition process and low interface roughness, although interdiffusion is present at the interfaces. Preliminary experiments indicate that the XUV laser output intensity was increased when a multilayer mirror was added to allow a double pass through the gain medium.

Paper Details

Date Published: 1 January 1992
PDF: 7 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51275
Show Author Affiliations
Claude Montcalm, National Research Council Canada and Univ. du Quebec (Canada)
Brian Thomas Sullivan, National Research Council Canada (Canada)
Henri Pepin, Univ. du Quebec (Canada)
Jerzy A. Dobrowolski, National Research Council Canada (Canada)
G. D. Enright, National Research Council Canada (Canada)


Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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