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Proceedings Paper

Differential equation method for design of multimirror x-ray projection lithography systems
Author(s): Cheng Wang; David L. Shealy
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Paper Abstract

Based on Korsch's method for design of high performance telescopes, a differential equation design method (DEDM) for soft x-ray projection lithography has been developed. This method enables one to solve numerically for the shapes of two mirrors in a system such that the entire system rigorously satisfies the conditions of aplanatism. The shape of the other mirror(s) in the system are adjusted to minimize the residual aberrations. Three-mirror and four-mirror projection systems have been designed by using DEDM. Analysis of results is presented.

Paper Details

Date Published: 1 January 1992
PDF: 16 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51274
Show Author Affiliations
Cheng Wang, Univ. of Alabama/Birmingham (United States)
David L. Shealy, Univ. of Alabama/Birmingham (United States)

Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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