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Proceedings Paper

Reflection masks for soft x-ray projection lithography
Author(s): Andrew M. Hawryluk; Natale M. Ceglio; D. W. Phillion; David P. Gaines; Raymond Browning; Roger Fabian W. Pease; Diane K. Stewart; Nicholas P. Economou
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Paper Abstract

Soft x-ray projection lithography (SXPL) may be used to fabricate high-resolution structures for future integrated circuits. This technique uses a reflection mask which is a substrate coated with an x-ray multilayer mirror and patterned with a thin (approximately 50 nm) layer of x-ray absorber. Mask patterning processes must not degrade the reflectivity of the x-ray mirror and mask repair techniques must be developed. The technical challenges of conventional reflecting optical imaging system designs are severe and mask technology can have a significant impact on this issue. Specifically, innovative mask designs can reduce the complexity of the optical system by decreasing the number of mirrors and replacing aspheric optical surfaces with spherical surfaces. We have developed a technique, called Encoded Mask Lithography, with which we have designed an optical system which uses only two (spherical) imaging mirrors and has < 100 nm spatial resolution, negligible distortion, and > 30 mm diameter field of view.

Paper Details

Date Published: 1 January 1992
PDF: 9 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51273
Show Author Affiliations
Andrew M. Hawryluk, Lawrence Livermore National Lab. (United States)
Natale M. Ceglio, Lawrence Livermore National Lab. (United States)
D. W. Phillion, Lawrence Livermore National Lab. (United States)
David P. Gaines, Lawrence Livermore National Lab. (United States)
Raymond Browning, Stanford Univ. (United States)
Roger Fabian W. Pease, Stanford Univ. (United States)
Diane K. Stewart, Micrion Corp. (United States)
Nicholas P. Economou, Micrion Corp. (United States)


Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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