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Proceedings Paper

Soft x-ray projection lithography system design and cost analysis
Author(s): Natale M. Ceglio; Andrew M. Hawryluk
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Paper Abstract

A baseline design and wafer cost analysis for a soft x-ray projection lithography (SXPL) system are presented. The design study provides an overview of the likely form and structure of a SXPL prototype. The wafer cost analysis provides an assessment of the relative importance of different cost factors in the SXPL system.

Paper Details

Date Published: 1 January 1992
PDF: 20 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51272
Show Author Affiliations
Natale M. Ceglio, Lawrence Livermore National Lab. (United States)
Andrew M. Hawryluk, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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