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EUV and soft x-ray multilayer optics
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Paper Abstract

The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ = 13.5 nm), microscopy in the "water window" (λ = 2.3 - 4.4 nm), astronomy (λ = 5 - 31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different mulilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.

Paper Details

Date Published: 25 February 2004
PDF: 10 pages
Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); doi: 10.1117/12.512502
Show Author Affiliations
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Sergiy Yulin, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Torsten Feigl, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Helmut Bernitzki, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Hans Lauth, JENOPTIK Laser, Optik, Systeme GmbH (Germany)

Published in SPIE Proceedings Vol. 5250:
Advances in Optical Thin Films
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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