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Proceedings Paper

Plasma imaging in the XUV wavelength range (175 A) using curved layered-synthetic-microstructure coated surfaces
Author(s): Sean P. Regan; L. K. Huang; Michael Finkenthal; Henry W. Moos; Troy W. Barbee
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Paper Abstract

A recently constructed calibration facility utilizing a Manson soft x-ray line source in the wavelength range of 8 - 114 angstroms and a Penning ionization discharge (PID) in the 100 - 350 angstroms range, has been used to map the reflectivity across a curved layered synthetic microstructure (LSM) coated surface. This calibrated mirror was also used to image the Al III emission ((lambda) equals 170 - 175 angstroms) from the PID.

Paper Details

Date Published: 1 January 1992
PDF: 5 pages
Proc. SPIE 1546, Multilayer and Grazing Incidence X-Ray/EUV Optics, (1 January 1992); doi: 10.1117/12.51250
Show Author Affiliations
Sean P. Regan, Johns Hopkins Univ. (United States)
L. K. Huang, Johns Hopkins Univ. (United States)
Michael Finkenthal, Hebrew Univ. (United States)
Henry W. Moos, Johns Hopkins Univ. (United States)
Troy W. Barbee, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 1546:
Multilayer and Grazing Incidence X-Ray/EUV Optics
Richard B. Hoover, Editor(s)

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