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Proceedings Paper

Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography
Author(s): Alexander A. Andreev; Jiri Limpouch; N. B. Voznesensky; Alexander P. Zhevlakov; Vladimir E. Yashin
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Paper Abstract

The advantages of droplet and claster Li-contained targets for debris free EUV generation are estimated on base of analytical modeling and simulation. Conversion efficiency of laser energy into EUV energy from such targets is found to reach a few percents. The laser prepulse is proposed to enhance the laser energy conversion into emission at wavelength of 13.5 nm.

Paper Details

Date Published: 7 January 2004
PDF: 9 pages
Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); doi: 10.1117/12.512456
Show Author Affiliations
Alexander A. Andreev, Institute for Laser Physics (Russia)
Jiri Limpouch, Czech Technical Univ. (Czech Republic)
N. B. Voznesensky, Institute for Laser Physics (Russia)
Alexander P. Zhevlakov, Institute for Laser Physics (Russia)
Vladimir E. Yashin, Institute for Laser Physics (Russia)


Published in SPIE Proceedings Vol. 5196:
Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications
George A. Kyrala; Jean-Claude J. Gauthier; Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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