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Proceedings Paper

Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography
Author(s): Udo Dinger; Guenther Seitz; Stefan Schulte; Frank Eisert; Christian Muenster; Stefan Burkart; Siegfried Stacklies; Christian Bustaus; Hubert Hoefer; Maximilian Mayer; Bernhard Fellner; Oliver Hocky; Markus Rupp; Klaus Riedelsheimer; Peter Kuerz
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Paper Abstract

EUVL, i.e. microlithography at 13nm is one of the most likely technologies to satisfy the requirements for the 45nm-node and below of the IC-manufacturing roadmap. The development of the first step and scan machines meeting production requirements of field size and resolution is in progress. A key component of these machines will be a diffraction limited, off-axis mirror system with aspherical surfaces. The optical surfaces of these mirrors have to be fabricated and measured with unprecedented accuracy. In recent years, technology development at Carl Zeiss SMT AG was focussed on the on-axis aspheres of the NA=0.30 micro exposure tool (MET). Presently this technology is transferred to the surfaces of a NA=0.25 off-axis, large field system The current status of the fabrication and metrology of both on-axis and off-axis mirrors will be reviewed.

Paper Details

Date Published: 13 January 2004
PDF: 11 pages
Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.511489
Show Author Affiliations
Udo Dinger, Carl Zeiss SMT AG (Germany)
Guenther Seitz, Carl Zeiss SMT AG (Germany)
Stefan Schulte, Carl Zeiss SMT AG (Germany)
Frank Eisert, Carl Zeiss SMT AG (Germany)
Christian Muenster, Carl Zeiss SMT AG (Germany)
Stefan Burkart, Carl Zeiss SMT AG (Germany)
Siegfried Stacklies, Carl Zeiss SMT AG (Germany)
Christian Bustaus, Carl Zeiss SMT AG (Germany)
Hubert Hoefer, Carl Zeiss SMT AG (Germany)
Maximilian Mayer, Carl Zeiss SMT AG (Germany)
Bernhard Fellner, Carl Zeiss SMT AG (Germany)
Oliver Hocky, Carl Zeiss SMT AG (Germany)
Markus Rupp, Carl Zeiss SMT AG (Germany)
Klaus Riedelsheimer, Carl Zeiss SMT AG (Germany)
Peter Kuerz, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 5193:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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