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Proceedings Paper

Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances
Author(s): Tami Kihara; Kiyoshi Yokomori
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Paper Abstract

A new technique to obtain the refractive index and thickness of a thin film simultaneously is presented. The reflectances of p polarized light and s polarized light are measured at various angles of incidence, and by a numerical procedure, the film index and thickness are extracted from the measured reflectances. The measurement and numerical procedure to determine the film index and thickness are simple and the obtained values are accurate. As an example, we made measurements on a single layer film (SiOJSi) and a double layer film (SiON/Si02/Si), and confirmed the obtained values were consistent.

Paper Details

Date Published: 1 January 1991
PDF: 9 pages
Proc. SPIE 1332, Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection, (1 January 1991); doi: 10.1117/12.51136
Show Author Affiliations
Tami Kihara, Ricoh Co. Ltd. (Japan)
Kiyoshi Yokomori, Ricoh Co. Ltd. (Japan)


Published in SPIE Proceedings Vol. 1332:
Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection
Chander Prakash Grover, Editor(s)

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