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Proceedings Paper

Recent results in capillary discharge soft x-ray laser research
Author(s): Jorge J. Rocca; Mario C. Marconi; Yong Wang; Bradley M. Luther; Francesco Pedacci; Michael Grisham; Georgiy Vaschenko; Carmen S. Menoni; Jorge Filevich; Libor Juha; Yu. P. Pershin; E. N. Zubarev; D. L. Voronov; V. A. Sevryukova; V. V. Kondratenko; Vyacheslav V. Shlyaptsev; Alexander Vinogradov; Igor Artioukov
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Paper Abstract

We report results of the development of capillary discharge driven metal-vapor plasma waveguides for the development of efficient laser-pumped soft x-ray lasers; and of the use of a previously developed capillary discharge Ne-like Ar 46.9 nm laser in study of the interaction of intense soft x-ray laser with materials. The guiding of a laser beam in a dense capillary discharge plasma channel containing a large density of Ag ions is reported. In term of applications we have conducted studies of materials modification and ablation with focalized 46.9 nm laser radiation at fluences between 0.1 and 100 J cm-2. The experiments demonstrated that the combined high repetition rate and high energy per pulse of the capillary discharge laser allows for the first time the processing of large surface areas with intense soft x-ray laser radiation. The damage threshold and damage mechanism of extreme ultraviolet Sc/Si multilayer mirror coatings was studied . Damage threshold fluences of ~ 0.08 J/cm2 were determined for coatings deposited on both borosilicate glass and Si substrates. Scanning and transmission electron microscopy, and small-angle X-ray diffraction techniques revealed the thermal nature of the damage mechanism. These results provide a benchmark for the use of Sc/Si multilayer mirrors in high fluence applications, and for the development of higher damage threshold mirrors. Soft x-ray laser ablation studies were also conducted for silicon and several plastic materials, including PMMA, Polyamide and PTFE.

Paper Details

Date Published: 19 December 2003
PDF: 10 pages
Proc. SPIE 5197, Soft X-Ray Lasers and Applications V, (19 December 2003); doi: 10.1117/12.510944
Show Author Affiliations
Jorge J. Rocca, Colorado State Univ. (United States)
Mario C. Marconi, Colorado State Univ. (United States)
Yong Wang, Colorado State Univ. (United States)
Bradley M. Luther, Colorado State Univ. (United States)
Francesco Pedacci, Colorado State Univ. (United States)
Michael Grisham, Colorado State Univ. (United States)
Georgiy Vaschenko, Colorado State Univ. (United States)
Carmen S. Menoni, Colorado State Univ. (United States)
Jorge Filevich, Colorado State Univ. (United States)
Libor Juha, Institute of Physics (Czech Republic)
Yu. P. Pershin, Kharkov State Polytechnic Univ. (Ukraine)
E. N. Zubarev, Kharkov State Polytechnic Univ. (Ukraine)
D. L. Voronov, Kharkov State Polytechnic Univ. (Ukraine)
V. A. Sevryukova, Kharkov State Polytechnic Univ. (Ukraine)
V. V. Kondratenko, Kharkov State Polytechnic Univ. (Ukraine)
Vyacheslav V. Shlyaptsev, Univ. of California/Davis (United States)
Alexander Vinogradov, P.N. Lebedev Physical Institute (Russia)
Igor Artioukov, P.N. Lebedev Physical Institute (Russia)


Published in SPIE Proceedings Vol. 5197:
Soft X-Ray Lasers and Applications V
Ernst E. Fill; Szymon Suckewer, Editor(s)

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