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Proceedings Paper

Near-field multiphoton nanolithography using an apertureless optical probe
Author(s): Xiaobo Yin; Nicholas Fang; Xiang Zhang; Ignacio B. Martini; Benjamin J. Schwartz
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Paper Abstract

Near-field multiphoton optical lithography is demonstrated by using ~120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produce the lithographic features with ~ 70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale multiphoton absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of two smaller than the previous multiphoton lithography in the far field.

Paper Details

Date Published: 3 November 2003
PDF: 8 pages
Proc. SPIE 5211, Nonlinear Optical Transmission and Multiphoton Processes in Organics, (3 November 2003); doi: 10.1117/12.510920
Show Author Affiliations
Xiaobo Yin, Univ. of California/Los Angeles (United States)
Nicholas Fang, Univ. of California/Los Angeles (United States)
Xiang Zhang, Univ. of California/Los Angeles (United States)
Ignacio B. Martini, Univ. of California/Los Angeles (United States)
Benjamin J. Schwartz, Univ. of California/Los Angeles (United States)


Published in SPIE Proceedings Vol. 5211:
Nonlinear Optical Transmission and Multiphoton Processes in Organics
A. Todd Yeates; Kevin D. Belfield; Francois Kajzar; Christopher M. Lawson, Editor(s)

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