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Proceedings Paper

Fabrication and metrology of 10X Schwarschild optics for EUV imaging
Author(s): Louis A. Marchetti
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Paper Abstract

ASML Optics recently completed two sets of 10X Schwarschild optics for use in an EUV imaging application. The 10X system consists of two spherical elements - a primary, convex element fabricated from fused silica and a secondary, concave element fabricated from Zerodur. This paper outlines the fabrication process, and discusses the challenges to optical metrology due to the particular form factor and the exacting tolerances placed on the optics. These challenges were met using a variety of metrology tools including full-aperture metrology, phase measuring microscopy (PMM), atomic force microscopy (AFM), and a new mid-frequency interferometer (SASHIMI). A comparison of the recently completed optics is made to the set of 10X optics previously fabricated and delivered in early 1999.

Paper Details

Date Published: 13 January 2004
PDF: 10 pages
Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.510318
Show Author Affiliations
Louis A. Marchetti, ASML Optics, LLC (United States)


Published in SPIE Proceedings Vol. 5193:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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