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Proceedings Paper

Advances in reflection grating technology for Constellation-X
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Paper Abstract

The Reflection Grating Spectrometer (RGS) on Constellation-X will require thousands of large gratings with very exacting tolerances. Two types of grating geometries have been proposed. In-plane gratings have low ruling densities (~500 l/mm) and very tight flatness and assembly tolerances. Off-plane gratings require much higher ruling densities (~5000 l/mm), but have somewhat relaxed flatness and assembly tolerances and offer the potential of higher resolution and efficiency. The trade-offs between these designs are complex and are currently being studied. To help address critical issues of manufacturability we are developing a number of novel technologies for shaping, assembling, and patterning large-area reflection gratings that are amenable to low-cost manufacturing. In particular, we report results of improved methods for patterning the sawtooth grating lines that are required for efficient blazing, including the use of anisotropic etching of specially-cut silicon wafers to pattern atomically smooth grating facets. We also report on the results of using nanoimprint lithography as a potential means for replicating sawtooth grating masters. Our Nanoruler scanning beam interference lithography tool allows us to pattern large area gratings up to 300 mm in diameter. We also report on developments in grating assembly technology utilizing lithographically patterned and micromachined silicon metrology structures ("microcombs") that have achieved submicron assembly repeatability.

Paper Details

Date Published: 29 January 2004
PDF: 12 pages
Proc. SPIE 5168, Optics for EUV, X-Ray, and Gamma-Ray Astronomy, (29 January 2004); doi: 10.1117/12.510258
Show Author Affiliations
Ralf K. Heilmann, Massachusetts Institute of Technology (United States)
Mireille Akilian, Massachusetts Institute of Technology (United States)
Chih-Hao Chang, Massachusetts Institute of Technology (United States)
Carl G. Chen, Massachusetts Institute of Technology (United States)
Craig R. Forest, Massachusetts Institute of Technology (United States)
Chulmin Joo, Massachusetts Institute of Technology (United States)
Paul T. Konkola, Massachusetts Institute of Technology (United States)
Juan C. Montoya, Massachusetts Institute of Technology (United States)
Yanxia Sun, Massachusetts Institute of Technology (United States)
Jenny You, Massachusetts Institute of Technology (United States)
Mark L. Schattenburg, Massachusetts Institute of Technology (United States)


Published in SPIE Proceedings Vol. 5168:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy
Oberto Citterio; Stephen L. O'Dell, Editor(s)

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