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Proceedings Paper

Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry
Author(s): Ivan Ohlidal; Miloslav Ohlidal; Petr Klapetek; Vladimir Cudek; Milos Jakl
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Paper Abstract

In this paper, a new optical method for characterizing nonuniform thin films is employed. For applying this method the special experimental arrangement containing CCD camera as a detector is used. Using this experimental arrangement the spectral dependencies of the local reflectances are obtained. After treating these experimental data of the distributions of the values of the local thicknesses and local refractive index along a large areas of the substrates of the nonuniform films are found. Moreover, it is shown that this method can be used to determine strong nonuniformities in both the optical parameters. The method is illustrated through the optical characterization of a nonuniform ZnSe epitaxial thin film deposited onto gallium arsenide single-crystal substrate and nonuniform film formed by the mixture of CNx and SiOy deposited onto silicon single-crystal substrate.

Paper Details

Date Published: 31 December 2003
PDF: 12 pages
Proc. SPIE 5182, Wave-Optical Systems Engineering II, (31 December 2003); doi: 10.1117/12.509628
Show Author Affiliations
Ivan Ohlidal, Masaryk Univ. (Czech Republic)
Miloslav Ohlidal, Brno Univ. of Technology (Czech Republic)
Petr Klapetek, Masaryk Univ. (Czech Republic)
Czech Metrology Institute (Czech Republic)
Vladimir Cudek, Brno Univ. of Technology (Czech Republic)
Milos Jakl, Brno Univ. of Technology (Czech Republic)


Published in SPIE Proceedings Vol. 5182:
Wave-Optical Systems Engineering II
Frank Wyrowski, Editor(s)

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