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Proceedings Paper

Photolithographic processing of integrated optic devices in glasses
Author(s): Edgar A. Mendoza; Harry D. Gafney; David L. Morse
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Paper Abstract

The ability to produce changes in the refractive index of a glass of the order of 0.01 to 0.001 allows a laser beam to be guided through glass. However, to perform the functions required for passive elements demands the formation of highly resolved gradient index patterns. Porous glass impregnated with photosensitive organometallic compounds exhibits optical changes when exposed to light. Changes in transmission and refractive index can be induced and are permanent after consolidation of the glass. Photolithographic techniques for making channel waveguides of the order of 1-10 mm, and more complex optical circuits composed of active and passive components have been developed.

Paper Details

Date Published: 1 December 1991
PDF: 9 pages
Proc. SPIE 1583, Integrated Optical Circuits, (1 December 1991); doi: 10.1117/12.50907
Show Author Affiliations
Edgar A. Mendoza, Rutgers Univ. (United States)
Harry D. Gafney, Queens College/CUNY (United States)
David L. Morse, Corning Glass Works (United States)


Published in SPIE Proceedings Vol. 1583:
Integrated Optical Circuits

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