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Proceedings Paper

Wave-optical considerations in photolithography
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Paper Abstract

Wave-optical effects are becoming more pronounced as optical lithography is pushed towards its limit. Photomask topography scattering and wafer polarization effects caused by differences in coupling between transverse electric and transverse magnetic waves degrade image quality. But polarization may provide an extra dimension that allows lithographers to devise simple solutions to otherwise difficult problems such as phase assignment.

Paper Details

Date Published: 31 December 2003
PDF: 10 pages
Proc. SPIE 5182, Wave-Optical Systems Engineering II, (31 December 2003); doi: 10.1117/12.508622
Show Author Affiliations
Alfred K. Wong, Fortis Systems, Inc. (United States)
Christophe Pierrat, Fortis Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 5182:
Wave-Optical Systems Engineering II
Frank Wyrowski, Editor(s)

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