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Proceedings Paper

EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing
Author(s): Holger Kierey; Klaus F. Heidemann; Bernd H. Kleemann; Renate Winters; Wilhelm J. Egle; Wolfgang Singer; Frank Melzer; Rutger Wevers; Martin Antoni
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Paper Abstract

The radiation emitted from an EUV source is collected and focused by a suitable collector system. A reflective blazed grating is used in -1st diffraction order to select a definite spectral band around 13.5 nm wavelength from the broad-band emission spectrum of the source. The effective grating area is segmented into a set of different plane gratings, mounted on a common base plate. In order to focus the light from the collector system, the grating segments are tilted and form a best-fit polygon surface. A specific groove density variation on the grating segments significantly improves the imaging performance. In this paper, we report on design, fabrication and testing of the grating system.

Paper Details

Date Published: 13 January 2004
PDF: 9 pages
Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.507741
Show Author Affiliations
Holger Kierey, Carl Zeiss Laser Optics GmbH (Germany)
Klaus F. Heidemann, Carl Zeiss Laser Optics GmbH (Germany)
Bernd H. Kleemann, Carl Zeiss Laser Optics GmbH (Germany)
Renate Winters, Carl Zeiss Laser Optics GmbH (Germany)
Wilhelm J. Egle, Carl Zeiss Laser Optics GmbH (Germany)
Wolfgang Singer, Carl Zeiss SMT AG (Germany)
Frank Melzer, Carl Zeiss SMT AG (Germany)
Rutger Wevers, Carl Zeiss SMT AG (Germany)
Martin Antoni, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 5193:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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