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Proceedings Paper

EUV collectors: design, development, fabrication, and testing
Author(s): Wilhelm J. Egle; Wolfgang Hafner; Axel Matthes; Eral Erzin; Bernhard Gaenswein; Herbert Schwarz; Piotr Marczuk; Martin Antoni; Wolfgang Singer; Frank Melzer; Joachim Hainz
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Paper Abstract

EUV sources are designed to emit radiation around 13.5 nm wavelength into a solid angle of up to 2π sr. With a suitable Wolter type 1 grazing incidence optic such EUV photons can be collected with high efficiency and focussed onto a preferred target. Such Wolter type 1 collectors are characterized by densely nested concentric and confocal mirror shells with fixed distance from the source and the intermediate image. In this paper we will report on optical and mechanical design, development, fabrication and testing of nested Wolter type 1 collectors, capable of collecting and imaging EUV photons at 13.5 nm wavelength with high efficiency.

Paper Details

Date Published: 13 January 2004
PDF: 11 pages
Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.507736
Show Author Affiliations
Wilhelm J. Egle, Carl Zeiss Laser Optics GmbH (Germany)
Wolfgang Hafner, Carl Zeiss Laser Optics GmbH (Germany)
Axel Matthes, Carl Zeiss Laser Optics GmbH (Germany)
Eral Erzin, Carl Zeiss Laser Optics GmbH (Germany)
Bernhard Gaenswein, Carl Zeiss Laser Optics GmbH (Germany)
Herbert Schwarz, Carl Zeiss Laser Optics GmbH (Germany)
Piotr Marczuk, Carl Zeiss Laser Optics GmbH (Germany)
Martin Antoni, Carl Zeiss SMT AG (Germany)
Wolfgang Singer, Carl Zeiss SMT AG (Germany)
Frank Melzer, Carl Zeiss SMT AG (Germany)
Joachim Hainz, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 5193:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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