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Proceedings Paper

X-ray and EUV spectral instruments for plasma source characterization
Author(s): Alexander P. Shevelko; Yuri S. Kasyanov; Larry V. Knight; James Phillips; R. Steven Turley; D. Clark Turner; Oleg F. Yakushev
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Paper Abstract

A set of spectral analytic instruments has been developed for absolute intensity measurements in a spectral range of 1 - 600 Å: (1) several modifications of grazing incidence spectrographs; (2) EUV monochromator- spectrometer with a constant angle of deviation; (3) focusing crystal von Hamos spectrometer using cylindrical mica and pyrolytic graphite crystals and a CCD linear array as a detector. These instruments are useful for plasma diagnostics, x-ray and EUV spectroscopy of laser-generated plasmas and capillary discharge plasmas, x-ray and EUV reflectometry, radiometry and x-ray fluorescence application.

Paper Details

Date Published: 7 January 2004
PDF: 7 pages
Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); doi: 10.1117/12.507723
Show Author Affiliations
Alexander P. Shevelko, P.N. Lebedev Physical Institute (Russia)
Yuri S. Kasyanov, P.N. Lebedev Physical Institute (Russia)
Larry V. Knight, MOXTEK, Inc. (United States)
James Phillips, MOXTEK, Inc. (United States)
R. Steven Turley, Brigham Young Univ. (United States)
D. Clark Turner, MOXTEK, Inc. (United States)
Oleg F. Yakushev, P.N. Lebedev Physical Institute (Russia)


Published in SPIE Proceedings Vol. 5196:
Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications
George A. Kyrala; Jean-Claude J. Gauthier; Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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