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Proceedings Paper

Mask technologies for metastable atom lithography: photomask and physical mask
Author(s): Xin Ju; Mitsunori Kurahashi; Taku Suzuki; Yasushi Yamauchi
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Paper Abstract

Using TEM copper grid with different pitch size as physical mask, alkanethiolates self-assembled monolayers was patterned by a metastable helium atom beam, demonstrating pattern transfer with nanoscale edge width to the underlying gold film. We found that the mask was reproduced as positive- or negative patterns with high fidelity, and the repetition of lithographic patterns was good in different runs.

Paper Details

Date Published: 28 August 2003
PDF: 4 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.507555
Show Author Affiliations
Xin Ju, National Institute for Materials Science (Japan)
Mitsunori Kurahashi, National Institute for Materials Science (Japan)
Taku Suzuki, National Institute for Materials Science (Japan)
Yasushi Yamauchi, National Institute for Materials Science (Japan)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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