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Proceedings Paper

Optical correlator system design using optomechanical constraint equations to determine system sensitivities
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Paper Abstract

Finding the components of an optical system that are most sensitive to misalignment allows a designer to insulate them from outside perturbations or incorporate compensators to account for alignment errors. At Advanced Optical Systems, Inc. (AOS) we used opto-mechanical constraint (OMC) equations to analyze the misalignment sensitivity of an optical correlator system and develop a better design. The OMC equations provide sensitivity coefficients for each element in the design that can be used to determine which components create the greatest image shift and focus errors when not optimally aligned. The OMC analysis model of the optical correlator was verified using a test bench with lenses in adjustable mounts to induce known amounts of misalignment in multiple axes. The experimental data matched the calculated values for each tested lens. The OMC coefficients assisted in identifying (1) lenses that are sensitive to loose manufacturing tolerances, (2) where subsystem designs can be beneficial, and (3) materials that provide optimum thermal performance. We will show results from our latest optical correlator package built using the OMC model analysis, which was critical to making decisions in the opto-mechanical design state of system development. We will also discuss a MATLAB simulation of AOS' optical correlator that incorporates the opto-mechanical constraints into a digital simulation of the correlation image.

Paper Details

Date Published: 27 October 2003
PDF: 9 pages
Proc. SPIE 5176, Optomechanics 2003, (27 October 2003); doi: 10.1117/12.507542
Show Author Affiliations
Paul D. Burke, Advanced Optical Systems, Inc. (United States)
Arthur Caneer, Advanced Optical Systems, Inc. (United States)
Andy Whitehead, Advanced Optical Systems, Inc. (United States)
Alson Hatheway, Alson E. Hatheway, Inc. (United States)

Published in SPIE Proceedings Vol. 5176:
Optomechanics 2003
Alson E. Hatheway, Editor(s)

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