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Proceedings Paper

High-performance multilayer coatings for EUV lithography
Author(s): Eberhard Spiller
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Paper Abstract

We review the specification for the coatings in steppers for extreme ultraviolet (EUV) lithography and discuss the deposition methods that have produced such coatings. Thermal deposition by electron beam, magnetron sputtering, and ion beam deposition have all been able to achieve the requirements for future EUV optics. Ion beam sputtering has produced coatings with very few defects and can smooth substrate roughness and mitigate the effects of substrate defects.

Paper Details

Date Published: 13 January 2004
PDF: 9 pages
Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.507237
Show Author Affiliations
Eberhard Spiller, Spiller X-Ray Optics (United States)


Published in SPIE Proceedings Vol. 5193:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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