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Proceedings Paper

Mueller matrix polarimeter in 157nm
Author(s): Lianhua Jin; Hiroyuki Kowa; Yukitoshi Otani; Norihiro Umeda
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Paper Abstract

A vacuum Mueller matrix polarimeter is developed for measurement of the Mueller matrix of samples, partially, calcium fluoride materials in 157nm wavelength. From the measured Mueller matrix with no sample present, we found the influence of absorption error in the detector and orientation error in quarter-wave plates on measurement results. The birefringence of samples is determined from the Mueller matrix. Experimental results show this Mueller matrix polarimeter is available to be used for characterizing the intrinsic birefringence of materials for processed lens at the 157nm lithography.

Paper Details

Date Published: 4 November 2003
PDF: 8 pages
Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.507038
Show Author Affiliations
Lianhua Jin, Tokyo Univ. of Agriculture and Technology (Japan)
Hiroyuki Kowa, Uniopt Co., Ltd. (Japan)
Yukitoshi Otani, Tokyo Univ. of Agriculture and Technology (Japan)
Norihiro Umeda, Tokyo Univ. of Agriculture and Technology (Japan)


Published in SPIE Proceedings Vol. 5188:
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
Angela Duparre; Bhanwar Singh, Editor(s)

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