Share Email Print
cover

Proceedings Paper

Fabrication of 2D photonic crystal using multiple exposures
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We describe a novel approach to manufacture photonic crystal-based integrated systems based on a two-step process of interferometric patterning followed by optical direct-write of the functional elements. First, the photonic crystal lattice is patterned in photoresist using interferometric lithography, producing a large-area lithographic pattern quickly and easily. Second, the defects in the lattice to implement the functional devices are created using optical direct write with a strongly focused optical beam. After patterning processes, the mask is developed and a dry-etching process is used to transfer the pattern into the substrate. This hybrid approach possesses an advantage in terms of fabrication time and cost as compared to E-beam lithography for the patterning of large-scale photonic crystal-based systems.

Paper Details

Date Published: 10 November 2003
PDF: 8 pages
Proc. SPIE 5181, Wave Optics and Photonic Devices for Optical Information Processing II, (10 November 2003); doi: 10.1117/12.506900
Show Author Affiliations
Lin Pang, Univ. of California/San Diego (United States)
Wataru Nakagawa, Univ. of California/San Diego (United States)
Chiaho Tsai, Univ. of California/San Diego (United States)
Yeshaiahu Fainman, Univ. of California/San Diego (United States)


Published in SPIE Proceedings Vol. 5181:
Wave Optics and Photonic Devices for Optical Information Processing II
Pierre Ambs; Fred R. Beyette, Editor(s)

© SPIE. Terms of Use
Back to Top