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Proceedings Paper

The Exicor DUV birefringence measurement system and its application to measuring lithography-grade CaF2 lens blanks
Author(s): Baoliang Wang; C. Owen Griffiths; Rick R. Rockwell; Jennifer List; Doug Mark
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Paper Abstract

Optical lithography continues its transition to shorter wavelengths to support the semiconductor industry’s production of faster microchips to meet evolving market demands. The next step for optical lithography is likely to use the F2 excimer laser at 157.63 nm (157 nm,according to the industry’ s naming convention).At 157 nm, among the limited number of fluoride crystals with acceptable optical properties calcium fluoride is the only practical lens material for step and scan systems due to its readiness for mass production. Since the discovery of intrinsic birefringence in CaF2 at deep ultraviolet (DUV)wavelengths,the optical lithography industry has developed a critical interest in measuring birefringence at 157 nm. In response to this need, we have developed a DUV birefringence measurement system. In this article,we describe the working principle, system construction, technical performance and selected applications for measuring lithography grade calcium fluoride lens blanks at DUV wavelengths.

Paper Details

Date Published: 14 November 2003
PDF: 12 pages
Proc. SPIE 5192, Optical Diagnostic Methods for Inorganic Materials III, (14 November 2003); doi: 10.1117/12.506213
Show Author Affiliations
Baoliang Wang, Hinds Instruments, Inc. (United States)
C. Owen Griffiths, Hinds Instruments, Inc. (United States)
Rick R. Rockwell, Hinds Instruments, Inc. (United States)
Jennifer List, Hinds Instruments, Inc. (United States)
Doug Mark, Hinds Instruments, Inc. (United States)

Published in SPIE Proceedings Vol. 5192:
Optical Diagnostic Methods for Inorganic Materials III
Leonard M. Hanssen, Editor(s)

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